Abstract
Unbalanced magnetrons are increasingly used in research, technological and industrial applications, particularly those related with physical vapor deposition processes (PVD) used for the growth of thin films (Marulanda et al,. 2011; Olaya et al., 2011). These films have many applications as hard, optical, decorative and electronic coatings. The use of such magnetrons can significantly increase the growth rates of the films and the process efficiency, which also improves significantly the quality of the films obtained. In this work, measurements of the axial and radial components of the magnetic fields generated by an unbalanced magnetron with axial symmetry were carried out; it was found that the magnetic field of a magnetron built with a cylindrical and a concentric ring magnets with opposite polarities, correlated well with the magnetic field generated by two concentric coplanar loops, whose currents flow in opposite directions. The theoretical magnetic field was calculated applying the Biot -Savart law, and evaluated numerically using MatLab program.
Keywords
References
Biederman H. et al. 1999, Characterization of un unbalanced magnetron for composite film (metal/C:H), Vacuum 52: 415-420.
Bunshah Rointan F. 2001, HANDBOOK OF HARD COATINGS Deposition Technologies, Properties and Applications, Noyes Publications, New Jersey USA.
Han L., Zhao Y. Q., Wang Y. W., 2009, A new semi-analytical method analyzing the magnetic field in unbalanced magnetron sputte-ring system, Vacuum 83: 1317-1320.
Ikuta H.et al. 2009, Development of a magnetron sputtering system with an extraordinary strong magnetic field near the target, Vacuum 83:475–478.
Kelly P.J., Arnell R.D. 1998, The influence of magnetron configuration on ion current density and deposition rate in a dual unbalanced magnetron sputtering system, Surface and Coatings Technology 108–109: 317–322.
Kelly P.J., Arnell R.D. 2000, Magnetron sputtering: a review of recent developments and applications, Vacuum 56: 159-172.
Klevets N. I. 2006 Optimal design of magnetic systems, Journal of Magnetism and Magnetic Materials 306: 281–291.
Komath M., Mohan G. R., Mohan S.1999, Studies on the optimization of unbalanced magnetron sputtering, Vacuum 52: 307- 311.
Marulanda D. M., Olaya J. J., Piratoba U., Mariño A. Camps E. 2011, The effect of bilayer period and degree of unbalancing on magnetron sputtered Cr/CrN nano-multilayer wear and corrosion Thin Solid Films 519, 1886-1893.
Mattox Donald M. 1998 HANDBOOK OF PHYSICAL VAPOR DEPOSITION (PVD) PROCESSING, Noyes Publications, New Jersey USA.
Olaya J. J. et al. 2007, The influence of the magnetic field configuration on plasma parameters and microstructure of niobium nitride films, Surface & Coatings Technology 201: 6117-6121.
Olaya J. J., Piratoba U. and Rodil S. E., 2011, Resistencia a la corrosión de recubrimientos de CrN depositados por PVD con UBM: Tecnología eficiente y ambientalmente limpia, Rev. Lat. de Met. y Mat. 31(1):44-51.
Svadkovski, I.V Golosov D.A., Zavatskiy S.M., 2003 Characterization parameters for unbalanced magnetron sputtering systems, Vacuum 68:283–290.
This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
Copyright (c) 2023 Revista de la Academia Colombiana de Ciencias Exactas, Físicas y Naturales