Abstract
In this work NbN thin films have been grown through rf magnetron sputtering technique from an 8-NbN (99.99%) target. In particular, we have studied the influence of the additional N2 flux in the preparation chamber on crystallization and microstructure of the deposited films. The films have been characterized by X-Ray diffraction (XRD) in 0-20 configuration and at a grazing angle, scanning electron microscopy (SEM), and transmission electron microscopy (TEM). XRD results show that the films grown at different fluxes of N2 have high textured coefficients along the [200] direction. SEM results indicate the films have columnar growth with high homogeneity and an average thickness of 0.7 μm. TEM results reveal that the films have grown from crystalline nanoparticles of NbN with high texture along the (200) plane.
Keywords
References
Ishiguro T, Matsushima K, Hamasaki K "Sectional structures and electrical properties of ultrathin NbN/MgO bilayers on Si(I00)", J. Appl. Phys 73, 1151-1153, 1993.
Wang Z., Kawakami A., Uzawa Y., Komiyama B. J.," Superconducting properties and crystal structures of single-crystal niobium nitride thin films deposited at ambient substrate temperature", J. Appl. Phys. 79, 7837- 7842,1996.
Gotoh Y., Nagao M., Ura T., Tsuji H., Ishikawa J., "Ion beam assisted deposition of niobium nitride thin films for vacuum microelectronics devices", Nucl Instr. Meth. Phys. Res. B. 148, 925-931, 1999.
Wong M.S., Sproul WD, Chu X, Barnett S.A., "Reactive magnetron sputter deposition of niobium nitride films", J. Vac. Sci. Technol. A 11(4), 1528-1536 ,1993.
Havey K.S., Zabinski J.S., Walck S. D., "The chemistry, structure, and resulting wear properties of magnetron-sputtered NbN", Thin Solid Films, 303, 238- 245, 1997.
Alén P., Ritala M., Arstila K., Keinonen J., Leskela M., "The growth and diffusion barrier properties of atomic layer deposited NbN thin film", Thin Solid Films 49, 235- 239, 2005.
Yu J.H., Park D.S., Kim J.H., Jeong .T.S., Youn C. J., Hong K.J., "Post-growth annealing and wide bandgap modulation of BeZnO layers grown by RF co-sputtering of ZnO and Be targets", J. Mater. Sci. 45,130-135, 2010.
J.E. Alfonso, J. Torres,J.F Marco, "Influence of the substrate bias voltage on the crystallographic structure and surface composition of Ti6Al4V thin films deposited by rf magnetron sputtering", Brazilian J. Phys. Vol. 36 no. 3B, 993-996, 2006.
J. E. Alfonso, J. Buitrago,J. Torres, J. F. Marco, B. Santos, "Influence of fabrication parameters on crystallization, microstructure, and surface composition of NbN thin films deposited by rf magnetron sputtering", J. Mater. Sci. 45, 5528-5533, 2010.
Rutherford K. L., Hatto P.W., Davies C, Hutchings I.M., "Abrasive wear resistance of TiN/NbN multi-layers: measurement and neural network modeling", Surf. Coat. Technol., 86, 472-479, 1996.
Zhitomirsky V.N., Grimberg l., Rapport L., Travitzky N.A., Boxman R.L., Goldsmith S., Raihel A., Lapsker l., Weiss B. Z., "Structure and mechanical properties of vacuum arc-deposited NbN coatings", Thin Solid Films, 326, 134- 142, 1998.
Chu X., Wong M.S., Sproul W. D., Rhode S.L, Barnett S. A., "Deposition and properties of polycrystalline TiN/NbN superlattice coatings J. Vac. Sci. Technol.A10 1604-1609, 1992.
Bendavid A., Martin P. J., Kinder T.J., Preston E.W., "The deposition of NbN and NbC thin films by filtered vacuum cathodic arc deposition", Surf. Coat. Technol., 163, 347-352, 2003.
Huang J-H, Lau K-W, Yu G-P., "Effect of nitrogen flow rate on structure and properties of nanocrystalline TiN thin films produced by unbalanced magnetron sputtering", Surf. Coat. Technol. 191,17- 24, 2005.
B. A. Movchan and A. V. Demchishin, Fiz., "Study of the Structure and Properties of Dioxide thin, Met. Metalloved, 28, 83-90 ,1969.
This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.