Efecto del contenido de Ni en las propiedades ópticas y eléctricas de recubrimientos ZrTiSiNiN depositados por co-sputtering

Palabras clave

ZrTiSiNiN; Optical properties; Electrical resistivity; Sputtering. ZrTiSiNiN; Propiedades ópticas; Resistividad eléctrica; Sputtering.

Cómo citar

Prieto-Novoa, G. M., Borja-Goyeneche, E. N., & Olaya-Florez, J. J. (2019). Efecto del contenido de Ni en las propiedades ópticas y eléctricas de recubrimientos ZrTiSiNiN depositados por co-sputtering. Rev. Acad. Colomb. Cienc. Ex. Fis. Nat., 43(168), 366-374. https://doi.org/10.18257/raccefyn.840


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Películas delgadas de ZrTiSiNiN fueron depositadas sobre sustratos de vidrio y silicio mediante co-sputtering reactivo con magnetrón usando blancos de Ti5Si2, Zr. En esta investigación se varío el contenido de Ni en los recubrimientos mediante la adición de cubos de Ni ubicados sobre el blanco de Zr. La morfología superficial, la estructura cristalina y el espesor de las películas fueron evaluadas mediante microscopía electrónica de barrido (SEM), difracción de rayos X (XRD) e interferometría respectivamente. La resistividad eléctrica se midió mediante el método de cuatro puntas y sus propiedades ópticas se caracterizaron por espectroscopía ultravioleta / visible (UV/Vis). Con base en los resultados de XRD se observó que el Níquel actúa como refinador de grano al lograr disminuir el tamaño de cristalito de 27 nm hasta 15 nm cuando la concentración de Níquel aumenta de 0 at% a 6,8 at%. Tanto la resistividad eléctrica y el “band gap” óptico de los recubrimientos aumentaron con la disminución del tamaño del cristalito como resultado del aumento de la densidad de límites de grano y del efecto de confinamiento cuántico.



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